The Application of Ozone in Semiconductor Cleaning Processes: The Solubility Issue

This research examines the fundamental factors that influence ozone solubility in aqueous solutions and their impact on semiconductor cleaning applications. The study investigates how temperature, pH, and common chemical additives affect the concentration and stability of dissolved ozone, providing valuable data for optimizing wafer cleaning, oxide growth, photoresist stripping, and contamination removal processes. The authors demonstrate that ozone solubility is highly dependent on operating conditions and that careful control of process chemistry is essential for maximizing cleaning efficiency. The findings contribute to the development of more environmentally friendly semiconductor manufacturing techniques by supporting the use of ozone-based cleaning systems as an alternative to conventional chemical-intensive processes.