The Increasing Importance of the Use of Ozone in the Microelectronics Industry

This article explores the growing role of ozone technology in semiconductor manufacturing as a safer, more sustainable, and cost-effective alternative to traditional chemical cleaning processes. The authors examine the fundamental behavior of ozone in ultrapure water, including its decomposition kinetics, solubility characteristics, and interactions with various process conditions that influence cleaning performance. The paper also discusses practical applications such as silicon oxidation, photoresist removal, organic contamination control, and water reuse strategies. By highlighting both the technical advantages and environmental benefits of ozone-based cleaning systems, the study demonstrates why ozone has become an increasingly important technology for advanced microelectronics fabrication and contamination control.